Mikroèlektronika
ISSN 0544-1269 (Print)
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Keywords
Förster effect
bipolar transistor
charge qubit
dissociation
etching
fluorocarbon gases
gas temperature
ionization
kinetics
mechanism
memristor
modeling
molecular beam epitaxy
plasma
polymerization
quantum dot
radiation intensity
reduced electric field strength
resistive switching
silicon
specific power
Current Issue
Vol 53, No 6 (2024)
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Keywords
Förster effect
bipolar transistor
charge qubit
dissociation
etching
fluorocarbon gases
gas temperature
ionization
kinetics
mechanism
memristor
modeling
molecular beam epitaxy
plasma
polymerization
quantum dot
radiation intensity
reduced electric field strength
resistive switching
silicon
specific power
Current Issue
Vol 53, No 6 (2024)
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Author Details
Author Details
Murin, D. B.
Issue
Section
Title
File
Vol 53, No 4 (2024)
ТЕХНОЛОГИИ
Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Vol 53, No 3 (2024)
ДИАГНОСТИКА
Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Vol 52, No 6 (2023)
ДИАГНОСТИКА
PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
Vol 52, No 5 (2023)
ДИАГНОСТИКА
Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane
Vol 52, No 1 (2023)
ДИАГНОСТИКА
Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
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