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Keywords Förster effect bipolar transistor charge qubit dissociation etching fluorocarbon gases gas temperature ionization kinetics mechanism memristor modeling molecular beam epitaxy plasma polymerization quantum dot radiation intensity reduced electric field strength resistive switching silicon specific power
Current Issue Cover Page

Vol 53, No 6 (2024)

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Keywords Förster effect bipolar transistor charge qubit dissociation etching fluorocarbon gases gas temperature ionization kinetics mechanism memristor modeling molecular beam epitaxy plasma polymerization quantum dot radiation intensity reduced electric field strength resistive switching silicon specific power
Current Issue Cover Page

Vol 53, No 6 (2024)

Home > Search > Author Details

Author Details

Murin, D. B.

Issue Section Title File
Vol 53, No 4 (2024) ТЕХНОЛОГИИ Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Vol 53, No 3 (2024) ДИАГНОСТИКА Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Vol 52, No 6 (2023) ДИАГНОСТИКА PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
Vol 52, No 5 (2023) ДИАГНОСТИКА Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane
Vol 52, No 1 (2023) ДИАГНОСТИКА Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
 

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