Thickness of the Modified Polymer Layer Formed by Low-Temperature Plasma Treatment

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Аннотация

Experimental data presented in the literature on the depth of processing of polymer films using low-temperature plasma are considered. Changes in the chemical composition and structure along the depth of the samples have been studied using the modern experimental techniques of X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and transmission electron microscopy; precision etching was carried
out with an Ar+2500 cluster beam; and the pit depth was measured by profilometry. It has been found that the thickness of the modified layer is ≤50 nm and depends relatively little on the polymer nature.

Авторлар туралы

A. Gilman

Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences

Email: plasma@ispm.ru
Moscow, 117393 Russia

M. Piskarev

Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences

Email: plasma@ispm.ru
Moscow, 117393 Russia

A. Kuznetsov

Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences

Хат алмасуға жауапты Автор.
Email: plasma@ispm.ru
Moscow, 117393 Russia

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© А.Б. Гильман, М.С. Пискарев, А.А. Кузнецов, 2023